SynopsisThe global No-Flow Underfill (NUF) market was valued at US$ million in 2023 and is anticipated to reach US$ million by 2030, witnessing a CAGR of %during the forecast period 2024-2030. North American market for No-Flow Underfill (NUF) is estimated to inc.....
SynopsisLanthanum silicide, the English name is lanthanum disilicide, is a chemical substance with the chemical formula LaSi2. The global Lanthanum Silicide market was valued at US$ million in 2023 and is anticipated to reach US$ million by 2030, witnessing a CA.....
SynopsisHome > Sputtering Targets > Ceramic Oxide Sputtering Targets > Germanium Oxide Sputtering Targets (GeO2) Germanium Oxide Sputtering Targets (GeO2) Germanium Oxide Sputtering Targets (GeO2) Germanium Oxide Sputtering Targets (GeO2) Name .....
SynopsisLithium Bis(nonafluorobutanesulfonyl)imide is one of numerous organometallic compounds, which are useful for thin film deposition, industrial chemistry, pharmaceuticals, LED manufacturing, and others. The global Lithium Bis(nonafluorobutanesulfonyl)imide.....
SynopsisCommercial wall putty is a material used for smoothening and finishing interior walls before painting. It is a white cement-based powder that is mixed with water to form a smooth paste. This paste is then applied to walls to fill in imperfections, cracks, and .....
SynopsisCobalt sputtering target has the same properties as the metal cobalt. cobaltCobalt is a chemical element originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol o.....
SynopsisGypsum is a soft sulfate mineral composed of calcium sulfate dihydrate, with the chemical formula CaSO. 4· 2H2O. It is widely mined and is used as a fertilizer and as the main constituent in many forms of plaster, blackboard/sidewalk chalk, and drywall. .....
SynopsisTin Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The global Tin Sulfide Sputtering Target market was valued at US$ million in 2023 and is anti.....
SynopsisAluminum Neodymium Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The global Aluminu.....
SynopsisTitanium Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The global Titanium Boride Sputtering Target market was valued at US$ million in 2023 and.....
