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Global Semiconductor Used High Purity Sputtering Target Material Market Research Report 2024
Synopsis
Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. In this report, we counted the semiconductor use high purity sputtering target material with 4N (purity≥99.99%).
The global Semiconductor Used High Purity Sputtering Target Material market was valued at US$ 1763 million in 2023 and is anticipated to reach US$ 2204.7 million by 2030, witnessing a CAGR of 2.6% during the forecast period 2024-2030.
Global key players of semiconductor used high purity sputtering target material include JX Nippon Mining & Metals Corporation, Materion, Konfoong Materials International, Linde, Plansee SE, etc. Global top five manufacturers hold a share over 58%. The key players are mainly located in Europe, North America, China, and Japan. In terms of product, metal sputtering target material is the largest segment, with a share over 62%. And in terms of application, the largest application is consumer electronics, with a share over 39%, followed by vehicle electronics.
This report aims to provide a comprehensive presentation of the global market for Semiconductor Used High Purity Sputtering Target Material, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Semiconductor Used High Purity Sputtering Target Material.
Report Scope
The Semiconductor Used High Purity Sputtering Target Material market size, estimations, and forecasts are provided in terms of output/shipments (Tons) and revenue ($ millions), considering 2023 as the base year, with history and forecast data for the period from 2019 to 2030. This report segments the global Semiconductor Used High Purity Sputtering Target Material market comprehensively. Regional market sizes, concerning products by Type, by Application, and by players, are also provided.
For a more in-depth understanding of the market, the report provides profiles of the competitive landscape, key competitors, and their respective market ranks. The report also discusses technological trends and new product developments.
The report will help the Semiconductor Used High Purity Sputtering Target Material manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by Type, by Application, and by regions.
Market Segmentation
By Company
JX Nippon Mining & Metals Corporation
Materion
Konfoong Materials International Co., Ltd.
Linde
Plansee SE
Honeywell
TOSOH
TANAKA
ULVAC
Luvata
Hitachi Metals
Sumitomo Chemical
Longhua Technology Group (Luoyang) Co., Ltd.
GRIKIN Advanced Material Co., Ltd.
Umicore
Angstrom Sciences
Advantec
Changzhou Sujing Electronic Material
FURAYA Metals Co., Ltd
Segment by Type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
Segment by Application
Consumer Electronics
Vehicle Electronics
Communication Electronics
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
Chapter Outline
Chapter 1: Introduces the report scope of the report, executive summary of different market segments (by region, by Type, by Application, etc), including the market size of each market segment, future development potential, and so on. It offers a high-level view of the current state of the market and its likely evolution in the short to mid-term, and long term.
Chapter 2: Detailed analysis of Semiconductor Used High Purity Sputtering Target Material manufacturers competitive landscape, price, production and value market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Production/output, value of Semiconductor Used High Purity Sputtering Target Material by region/country. It provides a quantitative analysis of the market size and development potential of each region in the next six years.
Chapter 4: Consumption of Semiconductor Used High Purity Sputtering Target Material in regional level and country level. It provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and production of each country in the world.
Chapter 5: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 6: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product production/output, value, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Introduces the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 10: The main points and conclusions of the report.
Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. In this report, we counted the semiconductor use high purity sputtering target material with 4N (purity≥99.99%).
The global Semiconductor Used High Purity Sputtering Target Material market was valued at US$ 1763 million in 2023 and is anticipated to reach US$ 2204.7 million by 2030, witnessing a CAGR of 2.6% during the forecast period 2024-2030.
Global key players of semiconductor used high purity sputtering target material include JX Nippon Mining & Metals Corporation, Materion, Konfoong Materials International, Linde, Plansee SE, etc. Global top five manufacturers hold a share over 58%. The key players are mainly located in Europe, North America, China, and Japan. In terms of product, metal sputtering target material is the largest segment, with a share over 62%. And in terms of application, the largest application is consumer electronics, with a share over 39%, followed by vehicle electronics.
This report aims to provide a comprehensive presentation of the global market for Semiconductor Used High Purity Sputtering Target Material, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Semiconductor Used High Purity Sputtering Target Material.
Report Scope
The Semiconductor Used High Purity Sputtering Target Material market size, estimations, and forecasts are provided in terms of output/shipments (Tons) and revenue ($ millions), considering 2023 as the base year, with history and forecast data for the period from 2019 to 2030. This report segments the global Semiconductor Used High Purity Sputtering Target Material market comprehensively. Regional market sizes, concerning products by Type, by Application, and by players, are also provided.
For a more in-depth understanding of the market, the report provides profiles of the competitive landscape, key competitors, and their respective market ranks. The report also discusses technological trends and new product developments.
The report will help the Semiconductor Used High Purity Sputtering Target Material manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by Type, by Application, and by regions.
Market Segmentation
By Company
JX Nippon Mining & Metals Corporation
Materion
Konfoong Materials International Co., Ltd.
Linde
Plansee SE
Honeywell
TOSOH
TANAKA
ULVAC
Luvata
Hitachi Metals
Sumitomo Chemical
Longhua Technology Group (Luoyang) Co., Ltd.
GRIKIN Advanced Material Co., Ltd.
Umicore
Angstrom Sciences
Advantec
Changzhou Sujing Electronic Material
FURAYA Metals Co., Ltd
Segment by Type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
Segment by Application
Consumer Electronics
Vehicle Electronics
Communication Electronics
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
Chapter Outline
Chapter 1: Introduces the report scope of the report, executive summary of different market segments (by region, by Type, by Application, etc), including the market size of each market segment, future development potential, and so on. It offers a high-level view of the current state of the market and its likely evolution in the short to mid-term, and long term.
Chapter 2: Detailed analysis of Semiconductor Used High Purity Sputtering Target Material manufacturers competitive landscape, price, production and value market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Production/output, value of Semiconductor Used High Purity Sputtering Target Material by region/country. It provides a quantitative analysis of the market size and development potential of each region in the next six years.
Chapter 4: Consumption of Semiconductor Used High Purity Sputtering Target Material in regional level and country level. It provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and production of each country in the world.
Chapter 5: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 6: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product production/output, value, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Introduces the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 10: The main points and conclusions of the report.
Index1 Semiconductor Used High Purity Sputtering Target Material Market Overview
1.1 Product Definition
1.2 Semiconductor Used High Purity Sputtering Target Material Segment by Type
1.2.1 Global Semiconductor Used High Purity Sputtering Target Material Market Value Growth Rate Analysis by Type 2023 VS 2030
1.2.2 Metal Sputtering Target Material
1.2.3 Alloy Sputtering Target Material
1.2.4 Non-metal Sputtering Target Material
1.3 Semiconductor Used High Purity Sputtering Target Material Segment by Application
1.3.1 Global Semiconductor Used High Purity Sputtering Target Material Market Value Growth Rate Analysis by Application: 2023 VS 2030
1.3.2 Consumer Electronics
1.3.3 Vehicle Electronics
1.3.4 Communication Electronics
1.3.5 Others
1.4 Global Market Growth Prospects
1.4.1 Global Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts (2019-2030)
1.4.2 Global Semiconductor Used High Purity Sputtering Target Material Production Capacity Estimates and Forecasts (2019-2030)
1.4.3 Global Semiconductor Used High Purity Sputtering Target Material Production Estimates and Forecasts (2019-2030)
1.4.4 Global Semiconductor Used High Purity Sputtering Target Material Market Average Price Estimates and Forecasts (2019-2030)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global Semiconductor Used High Purity Sputtering Target Material Production Market Share by Manufacturers (2019-2024)
2.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value Market Share by Manufacturers (2019-2024)
2.3 Global Key Players of Semiconductor Used High Purity Sputtering Target Material, Industry Ranking, 2022 VS 2023 VS 2024
2.4 Global Semiconductor Used High Purity Sputtering Target Material Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global Semiconductor Used High Purity Sputtering Target Material Average Price by Manufacturers (2019-2024)
2.6 Global Key Manufacturers of Semiconductor Used High Purity Sputtering Target Material, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of Semiconductor Used High Purity Sputtering Target Material, Product Offered and Application
2.8 Global Key Manufacturers of Semiconductor Used High Purity Sputtering Target Material, Date of Enter into This Industry
2.9 Semiconductor Used High Purity Sputtering Target Material Market Competitive Situation and Trends
2.9.1 Semiconductor Used High Purity Sputtering Target Material Market Concentration Rate
2.9.2 Global 5 and 10 Largest Semiconductor Used High Purity Sputtering Target Material Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 Semiconductor Used High Purity Sputtering Target Material Production by Region
3.1 Global Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts by Region: 2019 VS 2023 VS 2030
3.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Region (2019-2030)
3.2.1 Global Semiconductor Used High Purity Sputtering Target Material Production Value Market Share by Region (2019-2024)
3.2.2 Global Forecasted Production Value of Semiconductor Used High Purity Sputtering Target Material by Region (2025-2030)
3.3 Global Semiconductor Used High Purity Sputtering Target Material Production Estimates and Forecasts by Region: 2019 VS 2023 VS 2030
3.4 Global Semiconductor Used High Purity Sputtering Target Material Production by Region (2019-2030)
3.4.1 Global Semiconductor Used High Purity Sputtering Target Material Production Market Share by Region (2019-2024)
3.4.2 Global Forecasted Production of Semiconductor Used High Purity Sputtering Target Material by Region (2025-2030)
3.5 Global Semiconductor Used High Purity Sputtering Target Material Market Price Analysis by Region (2019-2024)
3.6 Global Semiconductor Used High Purity Sputtering Target Material Production and Value, Year-over-Year Growth
3.6.1 North America Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts (2019-2030)
3.6.2 Europe Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts (2019-2030)
3.6.3 China Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts (2019-2030)
3.6.4 Japan Semiconductor Used High Purity Sputtering Target Material Production Value Estimates and Forecasts (2019-2030)
4 Semiconductor Used High Purity Sputtering Target Material Consumption by Region
4.1 Global Semiconductor Used High Purity Sputtering Target Material Consumption Estimates and Forecasts by Region: 2019 VS 2023 VS 2030
4.2 Global Semiconductor Used High Purity Sputtering Target Material Consumption by Region (2019-2030)
4.2.1 Global Semiconductor Used High Purity Sputtering Target Material Consumption by Region (2019-2024)
4.2.2 Global Semiconductor Used High Purity Sputtering Target Material Forecasted Consumption by Region (2025-2030)
4.3 North America
4.3.1 North America Semiconductor Used High Purity Sputtering Target Material Consumption Growth Rate by Country: 2019 VS 2023 VS 2030
4.3.2 North America Semiconductor Used High Purity Sputtering Target Material Consumption by Country (2019-2030)
4.3.3 United States
4.3.4 Canada
4.4 Europe
4.4.1 Europe Semiconductor Used High Purity Sputtering Target Material Consumption Growth Rate by Country: 2019 VS 2023 VS 2030
4.4.2 Europe Semiconductor Used High Purity Sputtering Target Material Consumption by Country (2019-2030)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific Semiconductor Used High Purity Sputtering Target Material Consumption Growth Rate by Region: 2019 VS 2023 VS 2030
4.5.2 Asia Pacific Semiconductor Used High Purity Sputtering Target Material Consumption by Region (2019-2030)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa Semiconductor Used High Purity Sputtering Target Material Consumption Growth Rate by Country: 2019 VS 2023 VS 2030
4.6.2 Latin America, Middle East & Africa Semiconductor Used High Purity Sputtering Target Material Consumption by Country (2019-2030)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
5 Segment by Type
5.1 Global Semiconductor Used High Purity Sputtering Target Material Production by Type (2019-2030)
5.1.1 Global Semiconductor Used High Purity Sputtering Target Material Production by Type (2019-2024)
5.1.2 Global Semiconductor Used High Purity Sputtering Target Material Production by Type (2025-2030)
5.1.3 Global Semiconductor Used High Purity Sputtering Target Material Production Market Share by Type (2019-2030)
5.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Type (2019-2030)
5.2.1 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Type (2019-2024)
5.2.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Type (2025-2030)
5.2.3 Global Semiconductor Used High Purity Sputtering Target Material Production Value Market Share by Type (2019-2030)
5.3 Global Semiconductor Used High Purity Sputtering Target Material Price by Type (2019-2030)
6 Segment by Application
6.1 Global Semiconductor Used High Purity Sputtering Target Material Production by Application (2019-2030)
6.1.1 Global Semiconductor Used High Purity Sputtering Target Material Production by Application (2019-2024)
6.1.2 Global Semiconductor Used High Purity Sputtering Target Material Production by Application (2025-2030)
6.1.3 Global Semiconductor Used High Purity Sputtering Target Material Production Market Share by Application (2019-2030)
6.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Application (2019-2030)
6.2.1 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Application (2019-2024)
6.2.2 Global Semiconductor Used High Purity Sputtering Target Material Production Value by Application (2025-2030)
6.2.3 Global Semiconductor Used High Purity Sputtering Target Material Production Value Market Share by Application (2019-2030)
6.3 Global Semiconductor Used High Purity Sputtering Target Material Price by Application (2019-2030)
7 Key Companies Profiled
7.1 JX Nippon Mining & Metals Corporation
7.1.1 JX Nippon Mining & Metals Corporation Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.1.2 JX Nippon Mining & Metals Corporation Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.1.3 JX Nippon Mining & Metals Corporation Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.1.4 JX Nippon Mining & Metals Corporation Main Business and Markets Served
7.1.5 JX Nippon Mining & Metals Corporation Recent Developments/Updates
7.2 Materion
7.2.1 Materion Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.2.2 Materion Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.2.3 Materion Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.2.4 Materion Main Business and Markets Served
7.2.5 Materion Recent Developments/Updates
7.3 Konfoong Materials International Co., Ltd.
7.3.1 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.3.2 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.3.3 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.3.4 Konfoong Materials International Co., Ltd. Main Business and Markets Served
7.3.5 Konfoong Materials International Co., Ltd. Recent Developments/Updates
7.4 Linde
7.4.1 Linde Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.4.2 Linde Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.4.3 Linde Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.4.4 Linde Main Business and Markets Served
7.4.5 Linde Recent Developments/Updates
7.5 Plansee SE
7.5.1 Plansee SE Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.5.2 Plansee SE Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.5.3 Plansee SE Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.5.4 Plansee SE Main Business and Markets Served
7.5.5 Plansee SE Recent Developments/Updates
7.6 Honeywell
7.6.1 Honeywell Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.6.2 Honeywell Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.6.3 Honeywell Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.6.4 Honeywell Main Business and Markets Served
7.6.5 Honeywell Recent Developments/Updates
7.7 TOSOH
7.7.1 TOSOH Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.7.2 TOSOH Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.7.3 TOSOH Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.7.4 TOSOH Main Business and Markets Served
7.7.5 TOSOH Recent Developments/Updates
7.8 TANAKA
7.8.1 TANAKA Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.8.2 TANAKA Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.8.3 TANAKA Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.8.4 TANAKA Main Business and Markets Served
7.7.5 TANAKA Recent Developments/Updates
7.9 ULVAC
7.9.1 ULVAC Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.9.2 ULVAC Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.9.3 ULVAC Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.9.4 ULVAC Main Business and Markets Served
7.9.5 ULVAC Recent Developments/Updates
7.10 Luvata
7.10.1 Luvata Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.10.2 Luvata Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.10.3 Luvata Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.10.4 Luvata Main Business and Markets Served
7.10.5 Luvata Recent Developments/Updates
7.11 Hitachi Metals
7.11.1 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.11.2 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.11.3 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.11.4 Hitachi Metals Main Business and Markets Served
7.11.5 Hitachi Metals Recent Developments/Updates
7.12 Sumitomo Chemical
7.12.1 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.12.2 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.12.3 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.12.4 Sumitomo Chemical Main Business and Markets Served
7.12.5 Sumitomo Chemical Recent Developments/Updates
7.13 Longhua Technology Group (Luoyang) Co., Ltd.
7.13.1 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.13.2 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.13.3 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.13.4 Longhua Technology Group (Luoyang) Co., Ltd. Main Business and Markets Served
7.13.5 Longhua Technology Group (Luoyang) Co., Ltd. Recent Developments/Updates
7.14 GRIKIN Advanced Material Co., Ltd.
7.14.1 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.14.2 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.14.3 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.14.4 GRIKIN Advanced Material Co., Ltd. Main Business and Markets Served
7.14.5 GRIKIN Advanced Material Co., Ltd. Recent Developments/Updates
7.15 Umicore
7.15.1 Umicore Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.15.2 Umicore Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.15.3 Umicore Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.15.4 Umicore Main Business and Markets Served
7.15.5 Umicore Recent Developments/Updates
7.16 Angstrom Sciences
7.16.1 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.16.2 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.16.3 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.16.4 Angstrom Sciences Main Business and Markets Served
7.16.5 Angstrom Sciences Recent Developments/Updates
7.17 Advantec
7.17.1 Advantec Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.17.2 Advantec Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.17.3 Advantec Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.17.4 Advantec Main Business and Markets Served
7.17.5 Advantec Recent Developments/Updates
7.18 Changzhou Sujing Electronic Material
7.18.1 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.18.2 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.18.3 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.18.4 Changzhou Sujing Electronic Material Main Business and Markets Served
7.18.5 Changzhou Sujing Electronic Material Recent Developments/Updates
7.19 FURAYA Metals Co., Ltd
7.19.1 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Corporation Information
7.19.2 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Product Portfolio
7.19.3 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Production, Value, Price and Gross Margin (2019-2024)
7.19.4 FURAYA Metals Co., Ltd Main Business and Markets Served
7.19.5 FURAYA Metals Co., Ltd Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 Semiconductor Used High Purity Sputtering Target Material Industry Chain Analysis
8.2 Semiconductor Used High Purity Sputtering Target Material Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 Semiconductor Used High Purity Sputtering Target Material Production Mode & Process
8.4 Semiconductor Used High Purity Sputtering Target Material Sales and Marketing
8.4.1 Semiconductor Used High Purity Sputtering Target Material Sales Channels
8.4.2 Semiconductor Used High Purity Sputtering Target Material Distributors
8.5 Semiconductor Used High Purity Sputtering Target Material Customers
9 Semiconductor Used High Purity Sputtering Target Material Market Dynamics
9.1 Semiconductor Used High Purity Sputtering Target Material Industry Trends
9.2 Semiconductor Used High Purity Sputtering Target Material Market Drivers
9.3 Semiconductor Used High Purity Sputtering Target Material Market Challenges
9.4 Semiconductor Used High Purity Sputtering Target Material Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer
Published By : QY Research
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